About Terbium Rotatable Sputtering Target
Terbium Rotatable Sputtering Target (CAS 7440-27-9) is a sputtering target for PVD thin-film deposition. NanoLithium supplies it for thin-film coatings, thin-film electrodes and materials research. Full specifications are shown below, and bulk or custom quantities can be quoted on request. We ship from Canada to the USA, Europe, South Korea and worldwide.
Terbium Rotatable Sputtering Target Properties (Theoretical)
| Molecular Weight | 158.93 |
|---|---|
| Appearance | Silvery |
| Melting Point | 1356 °C |
| Boiling Point | 3230 °C |
| Density | 8219 kg/m³ |
| Solubility in H2O | N/A |
| Electrical Resistivity | N/A |
| Electronegativity | 1.2 Paulings |
| Heat of Vaporization | 70 K-Cal/gm atom at 3123 °C |
| Poisson’s Ratio | ( form) 0.261 |
| Specific Heat | 0.0437 Cal/g/K @ 25 °C |
| Tensile Strength | 60 MPa |
| Thermal Conductivity | 0.111 W/cm/K @ 298.2 K |
| Thermal Expansion | (r.t.) (poly) 10.3 µm/(m·K) |
| Vickers Hardness | 863 MPa |
| Young’s Modulus | ( form) 55.7 GPa |
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