About Magnesium Zirconium Sputtering Target
Magnesium Zirconium Sputtering Target (formula MgZr) is a sputtering target for PVD thin-film deposition. NanoLithium supplies it for thin-film coatings, thin-film electrodes and materials research. Full specifications are shown below, and bulk or custom quantities can be quoted on request. We ship from Canada to the USA, Europe, South Korea and worldwide.
Magnesium Zirconium Sputtering Target Properties (Theoretical)
| Compound Formula | MgZr |
|---|---|
| Molecular Weight | 115.529 |
| Appearance | Metallic target |
| Melting Point | 650 °C (1200 °F) |
| Boiling Point | N/A |
| Density | 1.8 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 0.00000570 ohm-cm |
| Poisson’s Ratio | 0.29 |
| Specific Heat | 1040 J/kg-K |
| Tensile Strength | 180 MPa (Ultimate)/ 51 MPa (Yield) |
| Thermal Conductivity | 120 W/m-K |
| Thermal Expansion | 27 µm/m-K |
| Young’s Modulus | 44 GPa |
| Monoisotopic Mass | 113.89 g/mol |
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