About Lutetium Rotatable Sputtering Target
Lutetium Rotatable Sputtering Target (CAS 7439-94-3) is a sputtering target for PVD thin-film deposition. NanoLithium supplies it for thin-film coatings, thin-film electrodes and materials research. Full specifications are shown below, and bulk or custom quantities can be quoted on request. We ship from Canada to the USA, Europe, South Korea and worldwide.
Lutetium Rotatable Sputtering Target Properties (Theoretical)
| Molecular Weight | 174.97 |
|---|---|
| Appearance | Silvery |
| Melting Point | 1652 °C |
| Boiling Point | 3402 °C |
| Density | 9.840 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 79.0 microhm-cm @ 25°C |
| Electronegativity | 1.2 Paulings |
| Heat of Vaporization | 90 K-Cal/gm atom at 3395°C |
| Poisson’s Ratio | 0.261 |
| Specific Heat | 0.037 Cal/g/K @ 25°C |
| Tensile Strength | N/A |
| Thermal Conductivity | 0.164 W/cm/K @ 298.2 K |
| Thermal Expansion | (r.t.) (poly) 9.9 µm/(m·K) |
| Vickers Hardness | 1160 MPa |
| Young’s Modulus | 68.6 GPa |
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