About Ytterbium Rotatable Sputtering Target
Ytterbium Rotatable Sputtering Target (CAS 7440-64-4) is a sputtering target for PVD thin-film deposition. NanoLithium supplies it for thin-film coatings, thin-film electrodes and materials research. Full specifications are shown below, and bulk or custom quantities can be quoted on request. We ship from Canada to the USA, Europe, South Korea and worldwide.
Ytterbium Rotatable Sputtering Target Properties (Theoretical)
| Molecular Weight | 173.04 |
|---|---|
| Appearance | Silvery solid |
| Melting Point | 824 °C |
| Boiling Point | 1196 °C |
| Density | 6.9 g/cm3 (20 °C) |
| Solubility in H2O | N/A |
| Electrical Resistivity | 2.50 µΩ·cm |
| Electronegativity | 1.1 Paulings |
| Heat of Fusion | 7.66 kJ/mol |
| Heat of Vaporization | 129 kJ/mol |
| Poisson’s Ratio | 0.207 |
| Specific Heat | 0.145 J/g·mol |
| Thermal Conductivity | 38.5 W/m·K |
| Thermal Expansion | 26.3 µm/m·K |
| Vickers Hardness | 205–250 MPa |
| Young’s Modulus | 23.9 GPa |
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