About Erbium Rotatable Sputtering Target
Erbium Rotatable Sputtering Target (CAS 7440-52-0) is a sputtering target for PVD thin-film deposition. NanoLithium supplies it for thin-film coatings, thin-film electrodes and materials research. Full specifications are shown below, and bulk or custom quantities can be quoted on request. We ship from Canada to the USA, Europe, South Korea and worldwide.
Erbium Rotatable Sputtering Target Properties (Theoretical)
| Molecular Weight | 382.56 |
|---|---|
| Appearance | Silvery |
| Melting Point | 1497°C |
| Boiling Point | 2868°C |
| Density | 9066 kg/m³ |
| Solubility in H2O | N/A |
| Electrical Resistivity | 107.0 microhm-cm @ 25°C |
| Electronegativity | 1.2 Paulings |
| Heat of Vaporization | 67 K-Cal/gm atom at 2863°C |
| Poisson’s Ratio | 0.237 |
| Specific Heat | 0.0401 Cal/g/K @ 25°C |
| Tensile Strength | N/A |
| Thermal Conductivity | 0.145 W/cm/K @ 298.2 K |
| Thermal Expansion | (r.t.) (poly) 12.2 µm/(m·K) |
| Vickers Hardness | 589 MPa |
| Young’s Modulus | 69.9 GPa |
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