Magnesium Oxide Rotatable Sputtering Target

Magnesium Oxide Rotatable Sputtering Target

Magnesium Oxide Rotatable Sputtering Target Health & Safety Information

Signal Word N/A
Hazard Statements N/A
Hazard Codes N/A
Precautionary Statements N/A
Flash Point Not applicable
Risk Codes N/A
Safety Statements N/A
RTECS Number OM3850000
Transport Information NONH
WGK Germany 1
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About Magnesium Oxide Rotatable Sputtering Target

Magnesium Oxide Rotatable Sputtering Target (formula MgO) is a sputtering target for PVD thin-film deposition. NanoLithium supplies it for thin-film coatings, thin-film electrodes and materials research. Full specifications are shown below, and bulk or custom quantities can be quoted on request. We ship from Canada to the USA, Europe, South Korea and worldwide.

Magnesium Oxide Rotatable Sputtering Target Properties (Theoretical)

Compound Formula MgO
Molecular Weight 40.3
Appearance White Target
Melting Point 2,852° C (5,166° F)
Boiling Point 3,600° C (6,512° F)
Density 3.58 g/cm3
Solubility in H2O N/A
Exact Mass 39.98
Monoisotopic Mass 39.98

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